Near Infrared Micro-Spectrophotometer. Fast Measurements of Curves Surfaces and Minute Areas
USPM-RU-W NIR Micro-Spectrophotometer performs fast, accurate spectrometry across a wide range of wavelengths of visible light to near-infrared.The ability to easily measure reflectivity of extremely small areas or curved surfaces that cannot be measured using ordinary spectrophotometers, makes the USPM-RU-W optimally suited for analyzing optical elements or minute electronics parts.
Right Image: example of reflectivity measurement : lens curvature
■ Wide range of wavelength from 380 to 1050 nm
■ Measures reflectivity on curved surface without contact
(Available as an option)
Image: Optical Path of Transmittance Measurement
Measure the transmittance of a plane sample by transmitting 2 mm parallel beams of lights through the sample to the spectrophotometry acceptance elements.
Image: Optical Path of 45-degree Reflectivity Measurement
Measure the reflectivity at an incidence angle of 45 degrees by reflecting 2 mm parallel beams of lights to the spectrophotometry acceptance elements.
Image: Film Thickness Measurement Screen-shot
Use reflectivity data to measure the thickness of single-layer or multi-layer films of approximately 50 nm to 10 μm.
Image: Object Color Measurement Screen-shot
Display an XY chromaticity diagram, an L*a*b* chromaticity diagram, and their related numeric values based on reflectivity data.
Provides High-speed Measurement
Quick, high repeatability measurements can be achieved in seconds using a flat field grating, line sensor and high-speed spectrophotometry.
Provides High-speed Measurement
Quick, high repeatability measurements can be achieved in seconds using a flat field grating, line sensor and high-speed spectrophotometry.
Optimally Suited for Reflectivity
Measurement of Extremely Small Parts and LensesOlympus has designed a new dedicated objective lens that provides non-contact measurements across an area of 17 to 70 μm diameters. The new lens provides high repeatability on even curved surfaces or minute electronic parts.
Anti-reflection Processing is Not Required on the Back of the Sample
Accurate measurement of surface reflectivity can be performed without the costly steps needed to prevent rear surface reflection. Rear surface-reflected light is reduced by means of special optics that block all out-of-focus light reflection similar to a confocal system. Whether your optical component is spherical,aspherical or flat, the USPM-RU-W does not require sample preparation through anti-reflection treatments.
Peak-valley Method
This method is used to calculate film thickness based on the periods between the peaks and valleys of the measured spectral reflectivity value, and is effective for measuring single-layer film. No complicated settings are required, so measuring film thickness is easy.
Fourier Transform Method
This method is used to calculate film thickness based on the periods between measured spectral reflectivity values, and is effective for measuring single-layer and multilayer films. The Fourier transform method eliminates noise, thus making analysis possible when it is difficult to detect peak and valley values.
Curve Fit Method
This method is used to calculate film thickness by estimating which structure has the smallest difference between the measured spectral reflectivity and the calculated reflectivity for that structure, and is effective for measuring single-layer and multilayer films. The curve fit method also makes it possible to analyze thin film in which peak and valley values are not apparent.
An easy-to-use user interface
Image: An example of GUI layout
Change the layout and position, size, and visibility of each window according to the measurement purpose and user needs.
Image: Reflectivity/transmittance graph, reflectivity/transmittance text, XY/L*a*b* chromaticity diagram
Spectral reflectivity/transmissivity graphs and text, color measurement (XY and L*a*b* chromaticity diagrams), and film thickness measurement values can be displayed on one screen for easy understanding.
Positioning the measuring point is easy by using a focusing window for Z axis alignment and centering (CT) window for X and Y axis alignment..
Positioning the measuring point is easy by using a focusing window for Z axis alignment and centering (CT) window for X and Y axis alignment.
Image: Work setting, layer setting, graph setting, parameter setting
The USPM-RU-W software can be configured to achieve optimum performance for your specific sample
System can be configured to provide good / no good designations automatically.
Evaluation of Lens Coating for reflectivity,color and film thickness.
Mobile Phone Camera Lenses
Projector Lenses
Digital Camera Lenses
Spectacle Lenses
Examining the Reflectivity and Film Thickness of Minute Electronic Parts.
LED Packages
Printed Circuit Boards
Reflectivity, Film Thickness and Transmittance measurment of Planar Optical Elements.
LCD color filters
Optical films
Optical Elements Reflectivity at an Incident Angle of 45 Degrees.
Prisms
Mirrors
|
|
Reflectivity measurement |
Transmittance Measurement*1 |
Reflectivity Measurement for 45-Degrees*1 |
|
||
|
Name |
NIR Micro-Spectrophotometer |
Transmittance measurement set for |
45-degree reflectance measurement set for |
|
||
|
Model |
USPM-RU-W |
|
||||
|
Measured wavelength |
380 to 1050 nm |
|
||||
|
Measurement method |
Compared with a reference sample for measurement |
Transmissivity is measured with 100% as standard |
Compared with a reference sample for measurement |
|
||
|
Measurement range |
See the specifications of the objective lens below |
Approx. 2.0 mm in diameter |
|
|||
|
Measurement repeatability(3σ) *2 |
Reflectivity measurement |
During use of 10x and 20x objective lenses |
±0.02% or less (430 to 1010 nm) |
±0.3% or less (430 to 1010 nm) |
|
|
|
During use of a 40x objective lens |
±0.05% or less (430 to 950 nm) |
|
||||
|
Film thickness measurement |
±1% |
- |
|
|||
|
Wavelength display resolution |
1nm |
|
||||
|
Lighting accessory |
Dedicated halogen light source, JC12V 55W (Average life: 700 hours) |
|
||||
|
Shift stage |
Loading surface size: 200 (W) x 200 (D) mm |
|
||||
|
Tilt stage |
－ |
Loading surface size: 140 (W) x 140 (D) mm |
|
|||
|
Weight |
Main body: Approx. 26 kg (not including PC) |
Main body: Approx. 31 kg (not including PC)*3 |
|
|||
|
Control power box: Approx. 6.7 kg |
|
|||||
|
Dimensions |
Main body: 360 (W) x 446 (D) x 606 (H) mm |
Main body: 360 (W) x 631 (D) x 606 (H) mm |
|
|||
|
Control power box: 250 (W) x 270 (D) x 125 (H) mm (Protruding parts are not included) |
|
|||||
|
Power specifications |
Input specifications: AC 100-240V (110V) 50/60Hz |
|
||||
|
Operating environment |
Horizontal place not subject to vibration |
|||||
|
|
||||||
|
|
||||||
*1 Optional unit *2 Measured under the measurement conditions of our company. *3 The total weight of both the transmissivity measurement set and 45-degrees reflectivity measurement set installed is approx. 33 kg.
Objective lens
|
Model |
USPM-OBL10X |
USPM-OBL20X |
USPM-OBL40X |
|
Magnification |
10x |
20x |
40x |
|
Measurement NA*4 |
0.12 |
0.24 |
0.24 |
|
Measurement range*5 |
70μm |
35μm |
17.5μm |
|
Operating distance |
14.3mm |
4.2mm |
2.2mm |
|
Operating distance |
±5 mm or more |
±1 mm or more |
±1 mm or more |
*4 It differs from objective lens' NA.
*5 Spot diameter