BX53 - Xmicro Solution

Light Microscopes

BX53

Upright Metallurgical Microscope

Advanced Microscopy Simplified

Functional

Designed for the traditional industrial microscopy, the BX3M has expanded functionality to meet a broader range of applications and inspection techniques

User-Friendly

Simplified and guided operation of the microscope settings make it easier for users to adjust and reproduce system settings.

Precision Optics

Olympus has a long history of producing quality optics, providing superior images both in the eyepieces and on the monitor

Fully Customizable

Modular design give users flexibility to build a system that meets their specific needs

7 observation methods for your applications

Brightfield, DIC

Spheroidal Graphite Cast Iron

DIC is an observation technique where the height of a sample is visible as a relief, similar to a 3D image with improved contrast; it is ideal for inspections of samples that have very minute height differences, including metallurgical structures and minerals.

Brightfield, Polarized

Sericite

Polarized Light is an observation technique where some structure of a sample, normally not detectable in brightfield, is visible as a relief. It is ideal for inspections of samples including metallurgical structures, crystals and minerals

NIR inspection on IC

Infrared observation can be conducted with the IR objective lenses, which enable the operators to nondestructively inspect the inside of IC chips packed and mounted on a PCB, utilizing the characteristics of silicon that transmit infrared light. 5X to 100X IR objectives are available with chromatic aberration correction from visible light wavelengths through the near infrared. Especially with an objective lens of 20X or more, the aberration caused by the silicon layer covering the observation object can be corrected by the correction collar to obtain a clear image.

Darkfield+Brightfield (MIX)

IC pattern on a semiconductor wafer

Darkfield is used for detecting minute scratches or flaws on a sample or inspecting samples with mirrored surfaces, such as wafers. MIX illumination enables users to view both patterns and colors.

Fluorescence, Fluorescence+Darkfield (MIX)

Photoresist residue on a semiconductor wafer

Fluorescence is used for samples that emit light when illuminated with a specially designed filter cube. This is used to detect contamination and photoresist residue. MIX illumination enables the observation of both the photoresist residue and IC pattern.

Brightfield, DIC

A hard disk

Differential interference contrast (DIC) is used to help view samples with minute height differences. It is ideal for inspections of samples having very minute height differences such as magnetic heads, hard-disk media, and polished wafers.

Transmitted, Transmitted+BF (MIX)

An LCD color filter

This observation technique is suitable for transparent samples such as LCDs, plastics, and glass materials. MIX illumination enables the observation of both the filter color and circuit pattern.

Highly Reliable Modular System

Six BX53M suggested configurations provide you with flexibility to choose the features that you need.

Entry

Easy setup with basic features

LCD Color filter (Transmitted/BF)

Standard

Simple to use with versatile upgrades

Microstructure with ferrite grains (reflected/DF)

Advanced

Supports numerous advanced features

Copper wire of coil
(BF + DF/MIX)

Fluorescence

Ideally suited for fluorescence observation

Resist on IC patterns (FL + DF/MIX)

Infrared

infrared observation to inspect integrated circuits

Silicon Layers on IC (infrared)

Polarization

Observing birefringence characteristics

Asbetos (Polarization)

Entry

Easy setup with basic features

LCD Color filter (Transmitted/BF)

Standard

Simple to use with versatile upgrades

Microstructure with ferrite grains (reflected/DF)

Advanced

Supports numerous advanced features

Copper wire of coil
(BF + DF/MIX)

Fluorescence

Ideally suited for fluorescence observation

Resist on IC patterns (FL + DF/MIX)

Infrared

infrared observation to inspect integrated circuits

Silicon Layers on IC (infrared)

Polarization

Observing birefringence characteristics

Asbetos (Polarization)

OBSERVATION METHOD

R-BF: Brightfield (Reflected)
T-BF: Brightfield (Reflected/Transmitted)
DF: Darkfield
DIC: Differential interference contrast / Simple polarization
MIX: MIX
FL: Fluorescence
IR: Infrared
POL: Polarization

_{*T-BF can be used when selecting Reflected/Transmitted microscope frame.}

: Standard

: Option

Entry

Standard

Advanced

Fluorescence

Infrared

Polarization

Microscope frame	Reflected or Reflected/Transmitted		Reflected or Reflected/Transmitted		Reflected	Transmitted
Standard	R-BF or T-BF	R-BF or T-BF or DF	R-BF or T-BF or DF or MIX	R-BF or T-BF or DF or FL	R-BF or IR	T-BF or POL
Option	DIC	DIC/MIX	DIC	DIC/MIX	－	－
Simple illuminator	－			－	－	－
Aperture legend	－				－
Coded hardware	－				－
Focus scale index
Light intensity manager				－	－
Hand switch operation					－	－
MIX observation					－	－
Objectives	Select from 3 objectives based on your applications		Select from 3 objectives based on your applications		Objectives for IR	Objectives for POL
Stage	Select from 5 stages based on the size of your samples		Select from 5 stages based on the size of your samples			Stage for POL

All-in-focus Images

The Extended Focus Imaging (EFI) function within PRECiV software captures images of samples whose height extends beyond the depth of focus of the objective and stacks them together to create one image that is all in focus. EFI can be executed with either a manual or motorized Z-axis and creates a height map for easy structure visualization. It is also possible to construct an EFI image while offline within PRECiV Desktop.

Panorama image

Stitch images easily and quickly just by moving the XY knobs on the manual stage; no motorized stage is necessary. PRECiV software uses pattern recognition to generate a panoramic image giving users a wider field of view than a single frame.

Faster Observation with LIGHT MANAGER

Manual Adjustment

The image gets too bright or dark when changing magnification or observation method.

User need to adjust to optimum brightness when changing from Brightfield to Darkfield

Automatic Adjustment

The light intensity is automatically adjusted to produce the optimal image when changing magnification or observation method.

Light intensity is automatically adjusted when changing from Brightfield to Darkfield

Consistent Color Temperature:

High-Intensity White LED Illumination

The BX53M utilizes a high-intensity white LED light sources for both reflected and transmitted light. The LED maintains a consistent color temperature regardless of intensity. LEDs provide efficient, long-life illumination that is ideal for inspecting materials science applications

View more sample types and sizes

Enables large samples or multiple samples to be easily placed on the stage. 150x100mm stage provides flexibility to users by enabling them to inspect more samples on one microscope, saving valuable lab space.

Flexibility for Sample Height and Weight

Accomodate Thick Samples

Samples up to 105 mm can be mounted on the stage with the optional modular unit.

Flexibility for Sample Size

Accomodate Large Samples

When sample is too large to place on a traditional microscope stage. Modular system, BXFM, can be mounted to a larger stand via a pole or mounted to another instrument of choice using a mounting bracket. This enables users to take advantage of our renowned optics even when their samples are unique in size or shape

Find Focus Quickly

The focus scale index on the frame supports quick access to the focal point. Operators can roughly adjust the focal point without viewing the sample through an eyepiece, saving time when inspecting samples that are different heights.

The tilting observation tube providing comfortable posture

The tilting observation tube’s extensive range enables operators to sit at the microscope in a comfortable posture.

Interlocked polarizer/analyser

The interlocked polarizer/analyzer slide IN/OUT on the optical axis by one action so that the switching between Nomarski DIC/POL
and other observation methods is performed speedy

Wafer holders and glass plates

Various types of stages and stage plates for sample placement, including wafer holders and glass plates.

Polarization Accessories

Bertrand Lens

With a conoscopic observation attachment, switching between orthoscopic and conoscopic observation is simple. It is focusable for viewing of clear back focal plane interference patterns. The Bertrand lens is focusable for clear viewing back focal plane interference patterns. The field stop makes it possible to consistently obtain sharp conoscopic images.

Strain Free Optics

Our polarized light objectives reduce internal strain to a minimum. This means a higher EF value, resulting in excellent image contrast.

Compensators and Wave Plates

Six different compensators are available for measurements of birefringence in rock and mineral thin sections. Measurement retardation level ranges from 0 to 20λ. For easier measurement and high image contrast, Berek and Senarmont compensators can be used, which change the retardation level in the entire field of view.

Specification Of BX53M (Suggested Configuration for general use)

			Entry		Standard		Advanced
Optical system			UIS2 optical system (infinity-corrected)
Main unit	Microscope frame		BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)
	Focus		Stroke: 25 mm Fine stroke per rotation: 100 μm Minimum graduation: 1 μm With upper limit stopper, torque adjustment for coarse handle
	Max. specimen height		Reflected: 65 mm (w/o spacer), 105 mm (with BX3M-ARMAD) Reflected/Transmitted: 35 mm (w/o spacer), 75 mm (with BX3M-ARMAD)
	Observation tube	Wide field (F.N.22)	U-TR30-2-2 Inverted: trinocular
	Illumination	Reflected light Transmitted light	BX3M-KMA-S White LED, BF/DIC/POL/MIX FS, AS (with centering mechanism), BF/DF interlocking		BX3M-RLAS-S Coded, White LED, BF/DF/DIC/POL/MIX FS, AS (with centering mechanism), BF/DF interlocking
			－	BX3M-LEDT White LED Abbe/long working distance condensers	－	BX3M-LEDT White LED Abbe/long working distance condensers	－	BX3M-LEDT White LED Abbe/long working distance condensers
	Revolving nosepiece		U-5RE-2 For BF: Quintuple		U-D6BDRE For BF/DF: Sextuple			U-D6BDRES-S For BF/DF : Sextuple, Coded
	Eyepiece（F.N.22)		WHN10 WHN10X-H
	MIX observation		－					BX3M-CB Control box BX3M-HS Hand switch U-MIXR-2 MIX slider for reflected light observation U-MIXRCBL Cable for MIXR
	Condenser (Long working distance)		－	U-LWCD	－	U-LWCD	－	U-LWCD
	Power cable		UYCP (x1)					UYCP (x2)
	Weight		Reflected: approx.15.8 kg (microscope frame 7.4 kg) Reflected/transmitted: approx. 18.3 kg (microscope frame 7.6 kg)
Objectives	MPLFLN set		MPLFLN5X, 10X, 20X, 50X, 100X BF/POL/FL observation		－
	MPLFLN BD set		－		MPLFLN5XBD, 10XBD, 20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
	MPLFLN-BD, LMPLFLN-BD set		－		MPLFLN5XBD, 10XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
	MPLFLN-BD, MXPLFLN-BD, LMPLFLN-BD set		－		MPLFLN5XBD, 10XBD, MXPLFLN20XBD, 50XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation
Stage (X x Y)	76 mm x 52 mm set		U-SVRM, U-MSSP Coaxial right handle stage / 76 (X) × 52 (Y) mm, with torque adjustment
	100 mm x 10 0mm set		U-SIC4R2, U-MSSP4 Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis
	100 mm x 100 (G) mm set		U-SIC4R2, U-MSSPG Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis (Glass plate)
	150 mm x 100 mm set		U-SIC64, U-SHG, U-SP64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis
	150 mm x 100 (G) mm set		U-SIC64, U-SHG, U-SPG64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis (Glass plate)
Option	MIX observation set*		BX3M-CB, BX3M-HS, U-MIXR-2, U-MIXRCBL				－
	DIC*		U-DICR
	Intermediate Tubes		U-CA, U-EPA2, U-TRU
	Filters		U-25ND6, U-25ND25, U-25LBD, U-25LBA, U-25Y48, U-AN360-3, U-AN360P, U-PO3, U-25IF550, U-25L42, U-25, U-25FR
	Filter for condenser		43IF550-W45, U-POT
	Stage plate		U-WHP64, BH2-WHR43, BH2-WHR65, U-WHP2
	Specimen holder		U-HRD-4, U-HLD-4, U-HRDT-4, U-HLDT-4
	Handle rubber		U-SHG, U-SHGT

_{*Cannot be used with U-5RE-2.}

BX53M / BXFM ESD UNITS

Items	Microscope frame	BX53MRF-S, BX53MTRF-S
	Illuminator	BX3M-KMA-S, BX3M-RLA-S, BX3M-URAS-S, BX3M-RLAS-S
	Nosepiece	U-D6BDREMC, U-D6BDRES-S, U-D5BDREMC-ESD, U-5RES-ESD
	Stage	U-SIC4R2, U-MSSP4

Specification of BX53M (Suggested Configuration for dedicated use)

				Fluorescence		Infrared	Polarized
Optical system				UIS2 optical system (infinity-corrected)
Main unit	Microscope frame			BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/ Transmitted)	BX53MRF-S (Reflected)	BX53MTRF-S (Reflected/Transmitted)
	Focus			Stroke: 25 mm Fine stroke per rotation: 100 μm Minimum graduation: 1 μm With upper limit stopper, torque adjustment for coarse handle
	Max. specimen height			Reflected: 65 mm (w/o spacer), 105 mm (with BX3M-ARMAD) Reflected/Transmitted: 35 mm (w/o spacer), 75 mm (with BX3M-ARMAD)
	Observation tube	Wide field (F.N.22)		U-TR30-2 Inverted: trinocular		U-TR30IR Inverted: trinocular for IR	U-TR30-2 Inverted: trinocular
		Polarized Light Intermediate Attachment (U-CPA)	Bertrand Lens	－		－	Focusable
			Bertrand Field Stop	－		－	ø3.4 mm diameter (fixed)
			Engage or disengage Bertrand lens changeover between orthoscopic and conoscopic observation	－		－	Position of slider ● in Position of slider ○ out
			Analyzer Slot	－		－	Rotatable Analyzer with Slot (U-AN360P-2)
	Illumination	Reflected light	FL observation	BX3M-URAS-S Coded universal reflected light, 4 position mirror unit turret, (standard: U-FWUS, U-FWBS, U-FWGS, U-FBF etc) With FS, AS (with centering mechanism), With shutter mechanism		－	－
			IR observation	－		BX3M-RLA-S 100W halogen lamp for IR, BF/IR, AS (with centering mechanism) U-LH100IR (Including 12V 10W HAL-L) 100W Halogen light source for IR TH4-100 100W power supply TH4-HS Hand switch U-RMT Extension cord	－
		Transmitted light	POL observation	－		－	BX3M-LEDT White LED Abbe/long working distance condensers
	Revolving nosepiece			U-D6BDRES-S For BF/DF : Sextuple, Coded		U-5RE-2 For BF : Quintuple	U-P4RE Quadruple, centerable attachable components 1/4 wavelength retardation plate (U-TAD), tint plate (U-TP530) and various compensators can be attached using plate adapter (U-TAD)
	Eyepiece（F.N.22)			WHN10X
				WHN10X-H			CROSS-WHN10X
	Mirror units			U-FDF For DF U-FBFL For BF, built-in ND filter U-FBF For BF, detachable ND filter U-FWUS For Ultra Violet-FL U-FWBS For Blue-FL U-FWGS For Green-FL		－
	Filter / Polarizer / Analyzer			U-25FR Frost filter		U-BP1100IR/U-BP1200IR Band path filters for IR	43IF550-W45 Green filter
				U-POIR Reflected polarizer slider for IR		U-AN360IR Rotatable analyzer slider for IR	U-AN360P-2 360° Dial-rotatable Rotatable minimum angle 0.1°
	Condenser			U-LWCD Long working distance		－	U-POC-2 Achromat strain-free condenser. 360°rotatable polarizer with swing-out achromatic top-lens. Click stop at position "0°" is adjustable. NA 0.9 (top-lens in) / NA 0.18 (top-lens out) Aperture iris diaphragm: adjustable from 2 mm to 21 mm diameters
	Slider / Compensators			－			U-TAD Slider (Plate adapter)
							U-TP530 Tint plate U-TP137 1/4 wavelength retardation plate
	Power cable			UYCP (x1)		UYCP (x2)	UYCP (x1)
	Weight			Reflected: approx.15.8 kg (microscope frame 7.4 kg)	Reflected/transmitted: approx. 18.3 kg (microscope frame 7.6 kg)	Approx.18.9 kg (microscope frame 7.4 kg)	Approx.16.2 kg (microscope frame 7.6 kg)
Reflected FL light source	Light guide			U-LGPS, U-LLGAD, U-LLG150, Light guide set		－	－
	Mercury lamp			U-LH100HGAPO1-7, USH-103OL (x2), U-RFL-T, U-RCV Mercury lamp set		－	－
Objectives	MPLFLN set			MPLFLN5X, 10X, 20X, 50X, 100X BF/DIC/POL/FL observation		－	－
	MPLFLN BD set			MPLFLN5XBD, 10XBD, 20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	MPLFLN-BD, LMPLFLN-BD set			MPLFLN5XBD, 10XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	MPLFLN-BD, MXPLFLN-BD, LMPLFLN-BD set			MPLFLN5XBD, 10XBD, MXPLFLN20XBD, 50XBD, LMPLFLN20XBD, 50XBD, 100XBD BF/DF/DIC/POL/FL observation		－	－
	IR set			－		LMPLN5XIR,10XIR,LCPLN20XIR,50XIR,100XIR IR observation	－
	POL set			－		－	UPLFLN4XP,10XP,20XP,40XP POL observation
Stage (X x Y)	76 mm x 52 mm set			U-SVRM, U-MSSP Coaxial right handle stage / 76 (X) × 52 (Y) mm, with torque adjustment
	100 mm x 10 0mm set			U-SIC4R2, U-MSSP4 Large-size coaxial right handle stage / 100 (X) x 100 (Y) mm, with lock mechanism in Y axis
	100 mm x 100 (G) mm set			U-SIC4R2, U-MSSPG Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with lock mechanism in Y axis (Glass plate)
	150 mm x 100 mm set			U-SIC64, U-SHG, U-SP64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis
	150 mm x 100 (G) mm set			U-SIC64, U-SHG, U-SPG64 Large-size coaxial right handle stage / 150 (X) x 100 (Y) mm, with torque adjustment, with lock mechanism in Y axis (Glass plate)
	POL set			－			U-SRP+U-FMP Polarizing rotatable stage + Mechanical stage
Option	MIX observation set*			BX3M-CB, BX3M-HS, U-MIXR-2, U-MIXRCBL
	DIC*			U-DICR
	Intermediate Tubes			U-CA, U-EPA2, U-TRU
	Filters			U-25ND6, U-25ND25, U-25LBD, U-25LBA, U-25Y48, U-AN360-3, U-AN360P, U-PO3, U-25IF550, U-25L42, U-25, U-25FR
	Filter for condenser			43IF550-W45, U-POT
	Stage plate			U-WHP64, BH2-WHR43, BH2-WHR65, U-WHP2
	Specimen holder			U-HRD-4, U-HLD-4, U-HRDT-4, U-HLDT-4
	Handle rubber			U-SHG, U-SHGT

Specification are subject to change without notice or obligation on the part of the manufacturer

Application Notes (1)

Using a microscope to inspect the solder wettability of mounting components

Blog (1)

Capabilities of Near-Infrared Imaging for Electronics and Semiconductor Inspection